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Personal data
Name: | Tatjana Dabrowski |
Date of birth: | February 28, 1982, Gdynia (Poland) |
Citizenship: | German |
Languages: | German (native), Polish (native), English (fluent), Russian and Spanish (basics) |
Employment
since 02/2012 |
Research assistance at the Fraunhofer Institute for Manufacturing Engineering and Advanced Materials IFAM in Oldenburg and in the Hybrid Materials Interfaces Group (HMI), Faculty of Production Engineering, University of Bremen (Germany) |
10/2011 - 12/2011 |
Preparatory courses in mathematics for master craftsmen and technicians at the Prager-Schule Hannover (Germany) |
10/2009 - 09/2011 |
Research assistance for students of human and dental medicine at the Georg-August University in Göttingen (Germany) |
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Research assistance for students of chemistry, biology, geo sciences and molecular medicine at the Georg-August University in Göttingen (Germany) |
04/2006 - 09/2009 |
Research assistance for students of physics at the Georg-August University in Göttingen (Germany) |
Education
Engineering
02/2012 - 07/2015 |
PhD research at the Fraunhofer Institute for Manufacturing Engineering and Advanced Materials IFAM, Oldenburg and the Hybrid Materials Interfaces Group (HMI), Faculty of Production Engineering, University of Bremen (Germany) |
October 2015 |
Submission of PhD thesis |
PhD thesis |
"Atomistic modeling of the charge process and optimization of catalysts positioning in porous cathodes of lithium/air batteries" |
Physics
10/2005 - 03/2006 |
Studies of physics at the Georg-August University in Göttingen (Germany) |
10/2005 - 03/2006 |
Studies of physics at the Jagiellonian University in Krakow (Poland) |
July 2011 |
Diploma in physics; final mark 'very good' |
Diploma thesis |
"Free energy fluctuations and chaos in the Edwards-Anderson spin glass" |
Mathematics
10/2013 - 09/2014 |
Studies of mathematics at the University of Bremen (Germany) |
10/2007 - 09/2011 |
Studies of mathematics at the Georg-August University in Göttingen (Germany) |
October 2007 |
Intermediate examination, final mark 'very good' |
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